11 January 1998
Source: http://www.access.gpo.gov/su_docs/aces/aces140.html

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[Federal Register: January 12, 1998 (Volume 63, Number 7)]
[Notices]
[Page 1828]
From the Federal Register Online via GPO Access [wais.access.gpo.gov]
[DOCID:fr12ja98-27]

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DEPARTMENT OF COMMERCE

National Institute of Standards and Technology


Announcement of a Public Meeting To Discuss the Development of
Methods for Micromachining Electrical Test Structures Replicated in
Silicon-On-Insulator Films To Enable the Use of High-Resolution
Transmission-Electron Microscopy for CD-Metrology

AGENCY: National Institute of Standards and Technology, Commerce.

ACTION: Notice of public meeting.

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SUMMARY: The National Institute of Standards and Technology (NIST)
invites interested parties to attend a meeting on January 30, 1998, to
discuss the development of Methods for Micromachining Electrical Test
Structures Replicated in Silicon-On-Insulator Films to Enable the Use
of High-Resolution Transmission-Electron Microscopy for CD-Metrology.
Attendees will be expected to sign a non-disclosure agreement before
participating in the meeting.

DATES: The Meeting will take place at 9 a.m. on January 30, 1998.
Interested parties should contact NIST to confirm their interest at the
address, telephone number, or FAX number shown below.

ADDRESSES: The meeting will take place at Conference Room 4020,
National Institute of Standards and Technology, Boulder, Colorado.
Inquiries should be sent to Room B360, Building 225, National Institute
of Standards and Technology, Gaithersburg, MD 20899-0001.

FOR FURTHER INFORMATION CONTACT:
Michael Cresswell, 301-975-2072; FAX 301-948-4081; e-mail:
michael.cresswell@nist.gov.

SUPPLEMENTARY INFORMATION: Any development program subsequent to the
meeting will be within the scope and confines of the Federal Technology
Transfer Act of 1986 (Pub. L. 99-502, 15 U.S.C. 3710a), which provides
federal laboratories, including NIST, with the authority to enter into
cooperative research agreements with qualified parties. Under this law,
NIST may contribute personnel, equipment, and facilities but no funds
to the cooperative research program. This is not a grant program.
    NIST and Sandia National Laboratories, in collaboration with 16
industry partners and SEMATECH, have recently completed an evaluation
of the first of two types of SOI films for linewidth reference-material
applications. The results have indicated that if a means of certifying
the electrical widths of reference features could be found, then a
range of low-cost reference materials for linewidth and related
dimensions could be developed for future SIA Roadmap applications.

    Dated: January 6, 1998.
Michael R. Rubin,
Deputy Chief Counsel.
[FR Doc. 98-656 Filed 1-9-98; 8:45 am]
BILLING CODE 3510-13-M
